By Tommi Kaariainen, David Cameron, Marja?Leena Kaariainen, Arthur Sherman(auth.)
Because the first version used to be released in 2008, Atomic Layer Deposition (ALD) has emerged as a strong, and infrequently most well liked, deposition know-how. the hot variation of this groundbreaking monograph is the 1st textual content to check the topic of ALD comprehensively from a pragmatic point of view. It covers ALD's software to microelectronics (MEMS) and nanotechnology; many vital new and rising purposes; thermal strategies for ALD development of nanometer thick motion pictures of semiconductors, oxides, metals and nitrides; and the formation of natural and hybrid materials.Content:
Chapter 1 basics of Atomic Layer Deposition (pages 1–31):
Chapter 2 Elemental Semiconductor Epitaxial motion pictures (pages 33–49):
Chapter three III?V Semiconductor motion pictures (pages 51–66):
Chapter four Oxide motion pictures (pages 67–159):
Chapter five Nitrides and different Compounds (pages 161–182):
Chapter 6 Metals (pages 183–206):
Chapter 7 natural and Hybrid fabrics (pages 207–213):
Chapter eight ALD functions and (pages 215–242):
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Extra info for Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications, Second Edition
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